利用射頻濺鍍製成硒化錳鋅薄膜及其特性的研究

Abstract

本研究利用射頻濺鍍製成各種不同錳離子濃度的硒化錳鋅薄膜,並研究其 特性.我們得到適當成長硒化錳鋅薄膜的條件.從掃描式電子顯微鏡看出其 薄膜晶粒的大小,並隨後退火時間的增加而變大;且隨錳離子濃度的增加而 變小.另外,由拉曼光譜的研究得到硒化錳鋅薄膜的TO及LO之振動模式. The ZnMnSe thin films with various Mn concentration were fabricated by using the RF sputtering technique with in-situ post annealing. We have obtained the optimum conditions to grow the ZnMnSe films. The grain size of as-deposited thin films could be varied by increasing the annealing time. We have also found the grain size decreased as the Mn concentration was increased. In addition, the Raman spectra investigation revealed some information to realize tht mode behavior of ZnMnSe alloy.