標題: Thermal Stability of Nickel Silicide and Shallow Junction Electrical Characteristics with Carbon Ion Implantation
作者: Tsui, Bing-Yue
Lee, Chen-Ming
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 2010
摘要: In this work, we investigated the impact of carbon ion implantation on the thermal stability of nickel silicide film and nickel-silicide-contact n(+)/p shallow junctions. A higher carbon ion implantation dose can prevent the nickel silicide film from agglomeration and phase transformation. However, good thermal stability does not necessarily lead to excellent junction current-voltage characteristics owing to the diffusion of nickel atoms. When the carbon ion implantation dose increases to 5 x 10(15) cm(-2), many crystal defects are created. Then, numerous nickel atoms diffuse along these defects into the junction depletion region during the silicide formation process, resulting in poor junction characteristics. The trade-off between thermal stability and junction electrical characteristics is discussed in this paper. Finally, two methods are suggested to solve the serious leakage current problem. (C) 2010 The Japan Society of Applied Physics
URI: http://hdl.handle.net/11536/6051
http://dx.doi.org/10.1143/JJAP.49.04DA04
ISSN: 0021-4922
DOI: 10.1143/JJAP.49.04DA04
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 49
Issue: 4
顯示於類別:期刊論文


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