標題: | Electromigration and Thermomigration in Pb-Free Flip-Chip Solder Joints |
作者: | Chen, Chih Tong, H. M. Tu, K. N. 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | microelectronic packaging;diffusion;reliability;current stressing;Joule heating;thermal gradient;underbump metallization |
公開日期: | 2010 |
摘要: | Pb-free solders have replaced Pb-containing SnPb solders in the electronic packaging industry due to environmental concerns. Both electromigration (EM) and thermomigration (TM) have serious reliability issues for fine-pitch Pb-free solder bumps in the flip-chip technology used in consumer electronic products. We review the unique features of EM and TM in flip-chip solder bumps, emphasizing the effects of current crowding and joule heating. In addition, the challenges to a better understanding of EM and TM in Pb-free solders are discussed. For example, the anisotropic nature of Sn microstructure in Pb-free solders can enhance the dissolution rates of Ni and Cu in solders driven by EM and TM. |
URI: | http://hdl.handle.net/11536/6094 http://dx.doi.org/10.1146/annurev.matsci.38.060407.130253 |
ISBN: | 978-0-8243-1740-9 |
ISSN: | 1531-7331 |
DOI: | 10.1146/annurev.matsci.38.060407.130253 |
期刊: | ANNUAL REVIEW OF MATERIALS RESEARCH, VOL 40 |
Volume: | 40 |
起始頁: | 531 |
結束頁: | 555 |
Appears in Collections: | Articles |
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