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dc.contributor.author許景誌en_US
dc.contributor.authorXu, Ying-Zhien_US
dc.contributor.author郭義雄en_US
dc.contributor.author吳光雄en_US
dc.contributor.authorGuo, Yi-Xiongen_US
dc.contributor.authorWu, Guang-Xiongen_US
dc.date.accessioned2014-12-12T02:16:27Z-
dc.date.available2014-12-12T02:16:27Z-
dc.date.issued1995en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT844429003en_US
dc.identifier.urihttp://hdl.handle.net/11536/61234-
dc.description.abstract探討基片（MgO）經退火與未退火處理時，利用雷射鍍膜製成之薄膜，研究在濺鍍時 ，不同溫度處理基片之條件下，薄膜之表面性質與微波表面損耗之關係。進而推論， 若以應用而言，微波元件製作時所需基片之最佳條件。zh_TW
dc.language.isozh_TWen_US
dc.subject電子物理zh_TW
dc.subject電子工程zh_TW
dc.subject退火zh_TW
dc.subject濺鍍zh_TW
dc.subject氧化鎂基板zh_TW
dc.subject釔鋇銅氧zh_TW
dc.subject微波性質zh_TW
dc.subjectELECTROPHYSICSen_US
dc.subjectELECTRONIC-ENGINEERINGen_US
dc.subjectMgOen_US
dc.subjectYBCOen_US
dc.subjectmicrowave propertiesen_US
dc.title氧化鎂基板處理條件對於釔鋇銅氧薄膜品質之影響zh_TW
dc.titleEFFECT OF SUBSTRATE CONDITION ON THE QUALITY OF SUPERCONDUCTING YBaCuO THIN FILMS DEPOSITED ON MgOen_US
dc.typeThesisen_US
dc.contributor.department電子物理系所zh_TW
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