電弧離子蒸著法被覆氮化鈦膜及快速熱退火對其之影響

Abstract

本研究乃利用電弧離子蒸著法，在不□鋼上被覆氮化鈦膜，探討不同製程 以及快速熱退火處理對其表面型態及機械性質的影響。研究結果顯示，所 被覆之氮化鈦膜經X-光繞射分析，顯現出較強的TiN(111)繞射峰。而經由 拉塞福回向散射能譜分析後，得到覆膜原子組成在TiN0.6到TiN1.0之間， 堆積因子則介於0.80∼0.98之間，顯示其有不錯的緻密性。另外，鍍膜製 程條件在較高的氮氣分壓、基板負偏壓及較低的電弧電流下，會使氮化鈦 覆膜表面的粗粒子數目及尺寸下降，表面粗糙度變佳，但同時也會造成鍍 膜速率下降。而經微硬度測試結果顯示，粗粒子數量對氮化鈦覆膜表面硬 度並無顯著地影響；與基板負偏壓有較大的關係，未加負偏壓及過高的負 偏壓皆會使得覆膜表面硬度值下降。氮化鈦覆膜在經500℃∼700℃快速熱 退火後，可發現部份附著在膜層表面的粗粒子脫離，顯露出沉積過程所產 生的孔洞。快速熱退火處理並使得覆膜表面粗糙度變佳，結晶性更好，緻 密度上升，磨擦係數下降，但也會使得硬度值下降至1600∼1700Hv左右。 In this thesis, titanium nitride films were deposited by the arc ion plating process onto stainless steel. We put our emphasis on the morphology and mechanical properties of as-deposited films after rapid thermal annealing.From X-ray analysis, we found that in all our sample only TiN(111) peak appeared. And from RBS data, we can deduce that the compositions ranges from TiN0.6 to TiN1.0, and the packing factors ranges from 0.80 to 0.98. The film has good densification.From SEM and α-step measurement, we found that under the condition of higher nitrogen partial pressure, negative bias and the TiN film surface are decreased, and the deposition rate is decreased, either. The results of microhardness measurement show that the quantity of the macropaticles had no significant effect on the surface microhardness. The decrease of the surface microhardness was caused by adding no and higher substract negative bias.It was found that part of macroparticles on TiN film escaped from TiN film surface after rapid thermal annealing（RTA）and the pores caused by deposition process appeared. RTA also made the film surface less rough, the crystalline and densification better, friction coefficient smaller, and also made the hardness lower to 1600∼1700 Hv about. This maybe caused by grain growth to soften the TiN film.