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標題: 利用矽烷,氧氣及四氟化碳在電子迴旋共振系統中沉積之低介電常數氟氧化矽的研究
The Study of Low Dielectric Constant Fluorinated Silicon Oxide, Fabricated by Electron Cyclotron Resonance System with SiH4, O2 and CF4 as Reaction Gases
作者: 王士瑋
WANG, SHIH-WEI
張國明
KOW-MING CHANG
電子研究所
關鍵字: 電子迴旋共振;低介電常數;氟氧化矽;Electron Cyclotron Resonance;Low Dielectric Constant;Fluorinated Silicon Oxide
公開日期: 1996
摘要: none
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT850428040
http://hdl.handle.net/11536/61907
Appears in Collections:Thesis


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