折射率變化對抗諧振反射光波導元件特性之影響

Abstract

本論文，我們發展一些方法用以分析折射率變化對抗諧振反射光波導 元件特性的影響。對二維結構而言，我們使用了 characteristic matrix method 及 beam propagationmethod (BPM) 來分析，並比較其結果。由 理論分析顯示，二維結構的元件特性對折射率變化非常敏感，可利用這個 結果以雙抗諧振反射光波導來設計光學開關或溫度感測元件。對三維結構 而言，我們使用了 eigenvalue method 、 effective index method 及 BPM 來分析，並比較其結果。由理論分析顯示，三維結構可容忍較大範圍 的折射率變化而不改變其元件特性。折射率變化與元件特性的關係可做為 以後設計及製造元件的參考。 In this thesis, we develop the necessary methods to analyze the influence of the refractive index variation for the antiresonant reflectingoptical waveguide (ARROW) devices. For the two dimentional slab ARROW, we usethe characteristic matrix method and beam propagation method (BPM); then compare their results. It can be seen that the performance of a slab ARROW isvery sensitive to the refractive index variation, and we can use this characteristic in dual slab ARROW to design optical switches or various sensors in the future. For the three dimentional strip ARROW, we use the eigenvalue method, the effective index method, and BPM; then compare their results.It can be seen that the performance of a strip ARROW is very good, and its maximum coupling efficiency will not significantly be influenced by the refractive index variation. The results give a useful reference for the designand fabrication of the ARROW devices.