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dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorHsu, H. H.en_US
dc.contributor.authorChen, W. B.en_US
dc.contributor.authorChin, Alberten_US
dc.contributor.authorYeh, F. S.en_US
dc.date.accessioned2014-12-08T15:07:53Z-
dc.date.available2014-12-08T15:07:53Z-
dc.date.issued2010en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/6213-
dc.identifier.urihttp://dx.doi.org/10.1149/1.3258042en_US
dc.description.abstractIn this article, we describe our successful fabrication of a CeO(2) metal-insulator-metal (MIM) capacitor with a low voltage nonlinearity. A low leakage current of 3.9 X 10(-7) A/cm(2) at -1 V and a small VCC-alpha similar to 421 ppm/V(2) were obtained at a high 10.8 fF/mu m(2) density for a Pt/CeO(2)/TaN MIM capacitor. The small VCC-alpha for a 15 nm thick CeO(2) dielectric (kappa similar to 20) was much better than the reported dielectrics of HfO(2), Tb-HfO(2), and Al(2)O(3)-HfO(2) at a similar kappa-value (15-20). The good analog performance was due to the combined effect of the CeO(2) dielectric and the high work-function metals. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3258042] All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleCharacteristics of Cerium Oxide for Metal-Insulator-Metal Capacitorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3258042en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume13en_US
dc.citation.issue1en_US
dc.citation.spageII16en_US
dc.citation.epageII19en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000271668500009-
dc.citation.woscount8-
Appears in Collections:Articles