完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Cheng, C. H. | en_US |
dc.contributor.author | Hsu, H. H. | en_US |
dc.contributor.author | Chen, W. B. | en_US |
dc.contributor.author | Chin, Albert | en_US |
dc.contributor.author | Yeh, F. S. | en_US |
dc.date.accessioned | 2014-12-08T15:07:53Z | - |
dc.date.available | 2014-12-08T15:07:53Z | - |
dc.date.issued | 2010 | en_US |
dc.identifier.issn | 1099-0062 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/6213 | - |
dc.identifier.uri | http://dx.doi.org/10.1149/1.3258042 | en_US |
dc.description.abstract | In this article, we describe our successful fabrication of a CeO(2) metal-insulator-metal (MIM) capacitor with a low voltage nonlinearity. A low leakage current of 3.9 X 10(-7) A/cm(2) at -1 V and a small VCC-alpha similar to 421 ppm/V(2) were obtained at a high 10.8 fF/mu m(2) density for a Pt/CeO(2)/TaN MIM capacitor. The small VCC-alpha for a 15 nm thick CeO(2) dielectric (kappa similar to 20) was much better than the reported dielectrics of HfO(2), Tb-HfO(2), and Al(2)O(3)-HfO(2) at a similar kappa-value (15-20). The good analog performance was due to the combined effect of the CeO(2) dielectric and the high work-function metals. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3258042] All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Characteristics of Cerium Oxide for Metal-Insulator-Metal Capacitors | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1149/1.3258042 | en_US |
dc.identifier.journal | ELECTROCHEMICAL AND SOLID STATE LETTERS | en_US |
dc.citation.volume | 13 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | II16 | en_US |
dc.citation.epage | II19 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000271668500009 | - |
dc.citation.woscount | 8 | - |
顯示於類別: | 期刊論文 |