利用射頻濺鍍製成硒化錳鋅薄膜及其特性的研究

Abstract

本研究係利用射頻濺鍍方法製成不同錳離子濃度之硒化錳鋅薄膜，並研究其特性。在鍍膜過程中，控制不同的加熱溫度、退火溫度以及選擇不同的基板，得到適於成長硒化錳鋅薄膜的條件。由X-Ray繞射，可得知薄膜之方向結構及結晶性。從掃描式電子顯微鏡看出薄膜結晶粒的大小，隨錳離子濃度的增加而變小；並隨退火的時間增加而變大。利用拉曼光譜研究其晶格振動及光學聲子特性。

The Zn1-xMnxSe thin films with various Mn concentration were fabricated by using the R.F. sputtering technique. We controlled the deposition conditions, for example, the substrate temperature, the period of in-situ post annealing and the different kind of substrate during the deposition process. We have obtained the optimum conditions to grow the Zn1-xMnxSe films. By the X-ray diffraction measurement, the structure and crystallization of the thin film. By using the scanning electron microscope, We have found the grain size decreased as the Mn concentration was increased. We have also found the grain size of as-deposited thin films could be varied by increasing the annealing time. The Raman spectra was used to study the lattice vibration and optical phonon property of Zni-xMnxSe thin film.