| 標題: | 選擇性鎢沉積在極大型積體電路上之應用 Selective CVD-W for ULSI applications |
| 作者: | 葉文冠 陳茂傑 電子研究所 |
| 公開日期: | 1996 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT856430105 http://hdl.handle.net/11536/62539 |
| Appears in Collections: | Thesis |
- Chemical mechanical polishing for selective CVD-W / Wang, MT;Yeh, WK;Tsai, MS;Tseng, WT;Chang, TC
- Chemical mechanical polishing for selective CVD-W / Wang, MT;Yeh, WK;Tsai, MS;Tseng, WT;Chang, TC
- 低壓化學氣相沉積鎢膜在極大型積體電路上之運用 / 葉達勳;Yeh, Ta-Hsun;張國明;Chang Kow-Ming
- Anomalous selective tungsten growth by chemical vapor deposition / Mei, YJ;Chang, TC;Sheu, JD;Yeh, WK;Pan, FM
- Chemical mechanical polishing for selective CVD-W / Wang, MT;Yeh, WK;Tsai, MS;Tseng, WT;Chang, TC
- 氟雜質對化學氣相沉積鎢膜閘極MOS電容的影響 / 施傑文;Shih, Chieh Wen;張國明 , 羅正忠;Kow-Ming Chang, Jen-Chung Lou
- Chemical mechanical polishing for selective CVD-W / Wang, MT;Yeh, WK;Tsai, MS;Tseng, WT;Chang, TC
- 化學氣相沉積鎢膜及矽化鎢膜在極大型積體電路之應用 / 王銘材;Wang Ming-Tsai;陳茂傑;Chen Mao-Chieh
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