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dc.contributor.author王英郎en_US
dc.contributor.author馮明憲, 曾偉志en_US
dc.date.accessioned2014-12-12T02:18:22Z-
dc.date.available2014-12-12T02:18:22Z-
dc.date.issued1996en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT856430119en_US
dc.identifier.urihttp://hdl.handle.net/11536/62554-
dc.language.isoen_USen_US
dc.title化學機械研磨在深次微米半導體元件製造之應用zh_TW
dc.title= Application of chemical-mechanical polishing to the fabrication of deep submicron semiconductor devicesen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
Appears in Collections:Thesis