| 標題: | 鉻鋁氧類及氮化矽類嵌附式減光型相移圖罩之研製與模擬 Fabrication and Simulation of CrAlxOy and SiNx as Embedded Materials for Embedded Attenuated Phase Shift Mask |
| 作者: | 張克文 Chang, Keh-Wen 龍文安 Loong, Wen-An 應用化學系碩博士班 |
| 關鍵字: | 鉻鋁氧;氮化矽 |
| 公開日期: | 1997 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT863500018 http://hdl.handle.net/11536/63555 |
| 顯示於類別： | 畢業論文 |
- 鉻矽氮類嵌附式減光型相移圖罩之研製與模擬 / 呂奎亮;Leu Kwei-liang;龍文安;Loong Wen-an
- 193奈米微影用正規與高透射率嵌附層材料之探討及減光型相移圖罩應用之模擬 / 林政旻;Cheng-ming Lin;龍文安;Dr. Loong Wen-an
- Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm / Lin, CM;Chang, KW;Lee, MD;Loong, WA
- 嵌附調細式相移光罩之研製與模擬 / 陳子清;Tzu-ching Chen;龍文安;Wen-an Loong
- 發展下一世代環保微影光罩結構材料 / 吳政三;Wu, Cheng-San;柯富祥;Ko, Fu-Hsiang
- AlSixOy as a high-transmittance embedded material of ternary attenuated phase-shifting mask and correlation between chemical composition and optical properties of AlSixOy in 193 nm lithography / Lin, CM;Loong, WA
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