純金屬陰極多弧離子沉積TiZrN薄膜特性之研究

Abstract

本實驗使用純Ti、Zr金屬靶以電弧離子沈積法在模具鋼及304不□鋼上被覆TiZrN薄膜，探討不同的製程參數對TiZrN鍍膜性質的影響，進行表面改質的目的。TiZrN鍍膜為TiZrN相、TiN相及ZrN相混合共存，並且三個相皆有強烈的{111}優選取向，TiZrN（111）繞射峰角度位於34.211度~35.449度之間。由鍍膜劈斷面微觀形貌觀察得知，在低氮氣分壓與高基材偏壓下，有明顯的柱狀晶結構生成。在各種不同製程參數下，TiZrN鍍膜之表面粗糙度為254nm~530nm。在鍍膜組成方面，Ti靶的電弧電流從單Ti靶40A增至雙Ti靶90A，Ti/Zr原子數比從0.25/0.75增至0.7/0.3。當氮氣分壓為2Pa、Zr靶電弧電流為90A、兩Ti靶電弧電流同時為40A及基材偏壓為-200V時，Ti/Zr原子數比為0.45/0.55，TiZrN鍍膜有最高的硬度值3452Hv0.05。

In this study it tried to deposit TiZrN thin films on SKD11 steels and 304 stainless steels in the way of arc ion plating by pure Ti and Zr metals and studied in the effects of various process parameters for coatings. In analysis, the structures, compositions of the coatings were studied by means of XRD,GDS,SEM and EDS. Vickers micro-hardness indentation and Rockswell hardness indentation were used to measure the hardness and adhesion of coatings. The roughness of coatings surface was determined by α-stepper. In SEM analysis we knew that there are obviously column structure in coatings in low N2 pressure, high arc currents and high substrate bias voltages. In GDS and EDS analysis, we knew that the components of coatings were so uniform. The solution of XRD analysis showed that there are three different phases, TiZrN, TiN and ZrN, in the coatings. All of them were (111) orientated, and the angles of TiZrN(111) diffraction peaks were between 34.211O and 35.449O . In various process parameters, the values of coatings surface roughness are between 254nm and 530nm. With increasing of targets current from single Ti target 40A to double Ti targets 90A, the rate of Ti/Zr increased from 0.25/0.75 to 0.7/0.3. In listed parameters: N2 Pressure was 2Pa, the Zr target current was 90A, both Ti targets current were 40A and the potential of substrate was -200V, the value of Ti/Zr was 0.45/0.55, and there was the highest value in hardness,3452Hv0.05.