完整後設資料紀錄
DC 欄位語言
dc.contributor.author黃俊源en_US
dc.contributor.authorChuen-Uan Huangen_US
dc.contributor.author黃 遠 東en_US
dc.contributor.author周 復 芳en_US
dc.contributor.authorYang-Tung Huangen_US
dc.contributor.authorChristina F. Jouen_US
dc.date.accessioned2014-12-12T02:20:47Z-
dc.date.available2014-12-12T02:20:47Z-
dc.date.issued1998en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT870428057en_US
dc.identifier.urihttp://hdl.handle.net/11536/64343-
dc.description.abstract本論文探討微機電開關在微波應用之設計與製造。論文中,設計了一套新的製程以製造此MEMS開關,此製程之特點為較以往之製程簡單,並克服了在蝕刻犧牲層(Sacrificial Layer)時,由於毛細現象(Capillarity)產生吸附效應(Stiction Effect)所造成結構的崩潰;並且,此套製程使整個結構都可由鋁所構成(All-Aluminum Structure),對於所設計的製程亦以IntelliCAD做製程及機械特性之模擬。 另外,又提出為薄膜式(電容式)開關提供一新的獨立偏壓方式,使其可在微波電路上更方便使用。尤其在相移器的應用上,此種獨立偏壓的方式使得此設計成為可能並具有實用性。zh_TW
dc.description.abstractIn this study, design and fabrication of MEMS switches for microwave applications are investigated. A new process was designed to fabricated these MEMS switches. This process improves the stiction effect due to the capillary phenomenon which leads to the crack of the structure during the sacrificial layer etching. The whole structure was constructed with Al, and the process was simulated with IntelliCAD. In this thesis, a new method for offering independent DC bias for the capacitive switch was proposed, which can be used practically in microwave circuits, such as phase shifters.en_US
dc.language.isoen_USen_US
dc.subject微機電開關zh_TW
dc.subject薄膜式開關zh_TW
dc.subjectMEMS switchesen_US
dc.title微機電開關在微波應用之設計與製造zh_TW
dc.titleDesign and fabrication of MEMS switches for microwave applicationsen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
顯示於類別:畢業論文