標題: | Very high hole mobility in p-type Si/SiGe modulation-doped heterostructures |
作者: | Tsai, WC Chang, CY Huang, GW Fang, FF Chang, YH Huang, CF 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | modulation-doped heterostructure;Shubnikov de Hass oscillation;quantum Hall effect;two-dimension hole gas;hole effective mass |
公開日期: | 15-三月-1997 |
摘要: | In this study, high-quality Si/Si1-xGex/Si p-type modulation-doped heterostructures were grown by ultrahigh-vacuum/chemical vapor deposition (UHV/CVD). High-field magnetotransport measurements revealed Shubnikov-de Hass oscillations in the longitudinal magneto resistance and the integer quantum Hall effect in transverse magnetoresistance illustrating the presence of a well-confined two-dimensional hole gas. The mobilities of the two-dimensional hole gas, as high as 12500 cm(2)/V . s at 0.65 K, were obtained for normal (doped layer at surface side) modulation-doped heterostructures with x = 0.12 at a sheet carrier concentration of 3.45 x 10(11) cm(-2). In addition, for this heterostructure, temperature-dependent measurements of Shubnikov-de Hass oscillations in the range 0.65 K-2.4 K were taken and the hole effective mass of 0.295m(0) + 0.01m(0) was obtained. |
URI: | http://dx.doi.org/10.1143/JJAP.36.L323 http://hdl.handle.net/11536/665 |
ISSN: | |
DOI: | 10.1143/JJAP.36.L323 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS |
Volume: | 36 |
Issue: | 3B |
起始頁: | L323 |
結束頁: | L326 |
顯示於類別: | 期刊論文 |