氮化鋁與鈦金屬介面反應之微觀結構分析

Abstract

氮化鋁(Aluminum Nitride, AlN)/鈦(Titanium, Ti)在1atm 氬(Ar)氣氛下，進行1200~1400℃各種不同時間之擴散反應，利用X光繞射(x-ray diffraction, XRD)、掃描式電子顯微鏡(scanning electron microscopy/energy dispersive spectroscopy, SEM/EDS)、電子微探儀(electron probe microanalyzer, EPMA)與穿透式電子顯微鏡transmission electron microscopy/energy dispersive spectroscopy, TEM/EDS)，分析擴散反應後介面之顯微結構。AlN/Ti在1300℃/1hr界面反應後，反應生成物從AlN側至Ti側依序為Y2O3(cubic)、TiN(Cubic, NaCl type)、Ti2AlN(hexagonal, AlCCr2 type)、Ti3AlN(cubic, perovskite type)與Ti3Al(hexagonal, Ni3Sn type)，其中Y2O3生成的來源是AlN中所添加的助燒結劑Y2O3，經擴散反應而在界面處析出。在1200℃/1hr擴散反應時，反應區並未生成Y2O3與Ti2AlN兩相， 經過1400℃/3hrs界面反應，反應區並無發現Ti3AlN相。

In this work, the interfacial reactions in the Ti/AlN diffusion couple were investigated. AlN/Ti diffusion couple were annealed at temperatures ranging from 1200 to 1400℃ in argon atmosphere for 1-3 hours. The microstructure of the reaction interface were characterized using x-ray diffraction (XRD), scanning electron microscopy (SEM), electron probe microanalyzer (EPMA) and analytical transmission electron microscopy (TEM/EDS). Phases of AlN (hexagonal), Y2O3 (cubic), TiN (cubic, NaCl type), Ti2AlN (cubic, AlCCr2 type), Ti3AlN (cubic, perovskite type), Ti3Al (hexagonal, Ni3Sn type), and α-Ti (hexagonal) were observed in sequence from AlN-side to Ti-side of the diffusion couple after reaction at 1300℃ for 1hr. Y2O3 was formed due to the adding of sintering aid for the preparatory of AlN. Y2O3 and Ti2AlN were not formed in the reaction zone after reaction at 1200℃/1hr, while Ti3AlN did not exist after the reaction at 1400℃/3hrs.