楔型光學薄膜之製鍍與研究

Abstract

在本論文中，我們利用電子束蒸鍍系統(E-beam)中加入離子輔助鍍法(IAD)，利用特殊支架將基板傾斜擺放，製鍍二氧化鈦(TiO2)及二氧化矽(SiO2)之楔型單層光學薄膜。主要探討楔型光學薄膜厚度、折射率、消光係數、穿透率等光學特性，以及薄膜非晶性之分析，並製鍍出厚度是線性變化，以及理想的折射率和消光係數之楔型單層薄膜，進而能將此兩種材料作疊加的設計和製鍍。在楔型多層光學薄膜中，我們分別設計和製鍍了九層的楔型寬帶高反射膜、楔型窄帶高反射膜，以及十七層的楔型窄帶濾光膜。我們發現在玻璃基板上每5mm的距離，中心波長有10nm有偏移量，並且是線性的變化。以HL和3H3L的設計形式可以有良好的光學成效，如果形式是5H5L則發生較差的光學成效。

In this thesis, we used electron-beam evaporation system with ion assisted deposition system, and substrate was placed leanly by special holder to fabricate TiO2 and SiO2 wedged single optical thin films. For these wedged single optical thin films, we studied the changes of optical properties including thickness、refractive index、extinction coefficient 、transmittance and amorphous character. The wedged single layer shows linear change in thickness and good refractive index and extinction coefficient. Based on this, we used TiO2 and SiO2 wedged single layer as relatively high and low refractive index materials to design and prepare multi-layer coatings. On wedged multi-layer coatings, we fabricated broadband and narrowband reflectors with 9 layers, and narrow-bandpass filter with 17 layers. We observed 10nm shift of central wavelength by 5mm separation on glass substrate, and linear change in thickness. The designs of HL and 3H3L produced good optical effects, however, the designs of 5H5L produced worse optical effects.