Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lo, M. H. | en_US |
dc.contributor.author | Tu, P. M. | en_US |
dc.contributor.author | Wang, C. H. | en_US |
dc.contributor.author | Hung, C. W. | en_US |
dc.contributor.author | Hsu, S. C. | en_US |
dc.contributor.author | Cheng, Y. J. | en_US |
dc.contributor.author | Kuo, H. C. | en_US |
dc.contributor.author | Zan, H. W. | en_US |
dc.contributor.author | Wang, S. C. | en_US |
dc.contributor.author | Chang, C. Y. | en_US |
dc.contributor.author | Huang, S. C. | en_US |
dc.date.accessioned | 2014-12-08T15:09:06Z | - |
dc.date.available | 2014-12-08T15:09:06Z | - |
dc.date.issued | 2009-07-27 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3190504 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/6939 | - |
dc.description.abstract | We report the fabrication and study of high efficiency ultraviolet light emitting diodes with inverted micropyramid structures at GaN-sapphire interface. The micropyramid structures were created by anisotropic chemical wet etching. The pyramid structures have significantly enhanced the light output efficiency and at the same time also improved the crystal quality by partially relieving the strain and reducing the dislocation defects in GaN. The electroluminescent output power at normal direction was enhanced by 120% at 20 mA injection current and the output power integrated over all directions was enhanced by 85% compared to a reference sample. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | dislocations | en_US |
dc.subject | electroluminescent devices | en_US |
dc.subject | etching | en_US |
dc.subject | gallium compounds | en_US |
dc.subject | III-V semiconductors | en_US |
dc.subject | light emitting diodes | en_US |
dc.subject | sapphire | en_US |
dc.subject | wide band gap semiconductors | en_US |
dc.title | High efficiency light emitting diode with anisotropically etched GaN-sapphire interface | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3190504 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 95 | en_US |
dc.citation.issue | 4 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000268611900009 | - |
dc.citation.woscount | 28 | - |
Appears in Collections: | Articles |
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