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dc.contributor.authorChen, Jem-Kunen_US
dc.contributor.authorChen, Zong-Yanen_US
dc.contributor.authorLin, Han-Chingen_US
dc.contributor.authorHong, Po-Daen_US
dc.contributor.authorChang, Feng-Chihen_US
dc.date.accessioned2014-12-08T15:09:15Z-
dc.date.available2014-12-08T15:09:15Z-
dc.date.issued2009-07-01en_US
dc.identifier.issn1944-8244en_US
dc.identifier.urihttp://dx.doi.org/10.1021/am900190cen_US
dc.identifier.urihttp://hdl.handle.net/11536/7069-
dc.description.abstractWe have used a very large scale integration process to generate well-defined patterns of polymerized 2-hydroxyethyl methacrylate (HEMA) on patterned Si(100) surfaces. An atom transfer radical polymerization initiator covalently bonded to the patterned surface was employed for the graft polymerization of HEMA to prepare the poly(2-hydroxyethyl methacrylate) (PHEMA) brushes, After immersing wafers presenting lines of these polymers in water and cyclohexane, we observed brush- and mushroom-like regions, respectively. for the PHEMA brushes, with various pattern resolutions. The PHEMA brushes behaved as "tentacles" that captured ferritin complexes from aqueous solution through entanglement between the brushes and the Ferritin proteins, whose ferritins were trapped due to the collapsing of the PHEMA. Using high-resolution scanning electron microscopy, we observed patterned ferritin iron cores on the Si surface after thermal removal of the patterned PHEMA brushes and ferritin protein sheaths.en_US
dc.language.isoen_USen_US
dc.subjectpatterned PHEMA brushen_US
dc.subjectVLSI processen_US
dc.subjectferritinen_US
dc.titlePatterned Poly(2-hydroxyethyl methacrylate) Brushes on Silicon Surfaces Behave as "Tentacles" To Capture Ferritin from Aqueous Solutionen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/am900190cen_US
dc.identifier.journalACS APPLIED MATERIALS & INTERFACESen_US
dc.citation.volume1en_US
dc.citation.issue7en_US
dc.citation.spage1525en_US
dc.citation.epage1532en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000268310800024-
dc.citation.woscount24-
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