掺錫氧化銦超薄膜之低頻雜訊研究

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DC Field	Value	Language
dc.contributor.author	許惟明	en_US
dc.contributor.author	Hsu, Wei-Ming	en_US
dc.contributor.author	林志忠	en_US
dc.contributor.author	Lin, Juhn-Jong	en_US
dc.date.accessioned	2014-12-12T02:34:43Z	-
dc.date.available	2014-12-12T02:34:43Z	-
dc.date.issued	2012	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#GT070052717	en_US
dc.identifier.uri	http://hdl.handle.net/11536/72385	-
dc.description.abstract	本論文主要測量低頻雜訊隨著退火溫度的變化，另外還有隨著溫度的變化，希望可以藉此了解低頻雜訊的變化趨勢，另外還有ITO薄膜之中低頻雜訊的產生原因。本論文之中主要是以ITO薄膜之中的載子流動性變化來做解釋。	zh_TW
dc.description.abstract	We discuss low- frequency noise as the annealing temperature and measure temperature changes. We try to explain carriers’ transmission characteristic in ITO films by mobility fluctuation.	en_US
dc.language.iso	zh_TW	en_US
dc.subject	低頻雜訊	zh_TW
dc.subject	氧化銦錫	zh_TW
dc.subject	薄膜	zh_TW
dc.subject	1/f noise	en_US
dc.subject	Indium tin oxide	en_US
dc.subject	ITO	en_US
dc.subject	thin film	en_US
dc.title	掺錫氧化銦超薄膜之低頻雜訊研究	zh_TW
dc.title	1/f noise in micrometer-sized ITO ultrathin films	en_US
dc.type	Thesis	en_US
dc.contributor.department	物理研究所	zh_TW
Appears in Collections:	Thesis

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