雷射直寫裝置之設計與實作

Abstract

本論文研究目標為設計並實作一雷射直寫裝置（Laser writer），用來製作光罩或對晶圓上的光阻直接寫入圖形。雷射寫頭部分以波長405 nm之藍光雷射光纖透過100X聚焦物鏡（N. A.＝9.0）聚焦於光阻上，並使用波長650 nm的紅光雷射位移感測器來對焦，寫頭及感測器組裝至一步進馬達平台，用以量測並調整寫頭與光阻之間的距離，再搭配雙軸長行程奈米定位平台，完成此一雷射直寫裝置。本雷射直寫裝置可完成在光阻上對圖形的寫入，雷射位移感測器及步進馬達平台可有效校準晶圓及光阻層整體的厚度差，達到對焦的機制。藉由調整藍光雷射輸出的功率以及曝光時的寫入速度可得到不同的線寬大小，由結果可得光劑量線密度對線寬的關係圖，如此便可有效控制本裝置寫入圖形時所需的參數，其最小線寬可達1 μm。

The laser writer is designed for research goal that can write patterns to the photoresist on the photomask or wafer. The design of the laser writer is using optical fiber with wavelength of 405 nm as the laser writing source and the 100X objective lens with numerical aperture of 0.90 as the focusing lens. The focus system is using a laser displacement detector with wavelength of 650 nm and a stepping motor Z-stage, which enables compensation for the thickness error from wafer and photoresist. The laser writer can successfully write lines to photoresist on wafer surface, which line width can be controlled and the minimum line width is 1μm.