離子束配向及光配向技術在大尺寸TFT-LCD之未來發展性研究

Abstract

In the recent years, the global market of large area TFT-LCD panels continues to grow rapidly, and the production method of LCD alignment in large area substrate is one of the most challenging tasks in this industry. LCD alignment using the conventional mechanical rubbing alignment is limited by debris contamination generated on the substrate and the difficulty at achieving uniform rubbing strength toward large area substrate. Approaches to develop alternative non-contact LCD alignment on large area substrate were carried out in two directions using ion beam alignment and photo alignment with the potential to increase image quality with wide viewing angle and higher resolution.

In this study, three interrelated subjects are covered. (1) A comprehensive overview of ion beam alignment and photo alignment. (2) A comparison of the capability of state-of-the-art ion beam alignment system and the UV exposure system for large area substrate processing. The disadvantage of ion beam alignment system and beam uniformity is discussed. (3) The issues of ion beam alignment and photo alignment in production are discussed. Although the ion source with long slit can improve beam uniformity, the equipment tool and processing method of photo alignment technology has already been introduced into mass production in industry. We predict photo alignment is most likely the direction of the future non-contact alignment technology with the development of more applicable photo alignment materials.

In the recent years, the global market of large area TFT-LCD panels continues to grow rapidly, and the production method of LCD alignment in large area substrate is one of the most challenging tasks in this industry. LCD alignment using the conventional mechanical rubbing alignment is limited by debris contamination generated on the substrate and the difficulty at achieving uniform rubbing strength toward large area substrate. Approaches to develop alternative non-contact LCD alignment on large area substrate were carried out in two directions using ion beam alignment and photo alignment with the potential to increase image quality with wide viewing angle and higher resolution.

In this study, three interrelated subjects are covered. (1) A comprehensive overview of ion beam alignment and photo alignment. (2) A comparison of the capability of state-of-the-art ion beam alignment system and the UV exposure system for large area substrate processing. The disadvantage of ion beam alignment system and beam uniformity is discussed. (3) The issues of ion beam alignment and photo alignment in production are discussed. Although the ion source with long slit can improve beam uniformity, the equipment tool and processing method of photo alignment technology has already been introduced into mass production in industry. We predict photo alignment is most likely the direction of the future non-contact alignment technology with the development of more applicable photo alignment materials.