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dc.contributor.authorWang, S. -L.en_US
dc.contributor.authorChen, C. -Y.en_US
dc.contributor.authorHsieh, M. -K.en_US
dc.contributor.authorLee, W. -C.en_US
dc.contributor.authorKung, A. H.en_US
dc.contributor.authorPeng, L. -H.en_US
dc.date.accessioned2014-12-08T15:09:46Z-
dc.date.available2014-12-08T15:09:46Z-
dc.date.issued2009-03-16en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3089238en_US
dc.identifier.urihttp://hdl.handle.net/11536/7475-
dc.description.abstractWe report repetitive phase-change memory (PCM) activity via the high- to low-resistance state transition in gallium-doped indium oxide (Ga:InO) induced by nanosecond electric pulses. The amorphous-to-crystalline phase transition of Ga:InO is found to occur at a crystallization temperature of similar to 250 degrees C with an activation energy of 1.27 +/- 0.07 eV. At the phase transition, we observe a change in two orders of magnitude in the PCM-device resistance, which can be correlated with the formation of (211) and {222} crystallites of bixbyite cubic In(2)O(3). We ascribe the phase-change mechanism to the Joule heating effect in Ga:InO.en_US
dc.language.isoen_USen_US
dc.subjectcrystallisationen_US
dc.subjectgalliumen_US
dc.subjectindium compoundsen_US
dc.subjectphase change memoriesen_US
dc.subjectsolid-state phase transformationsen_US
dc.titlePhase-change memory devices based on gallium-doped indium oxideen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3089238en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume94en_US
dc.citation.issue11en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000264380300080-
dc.citation.woscount8-
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