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dc.contributor.authorSeidel, J.en_US
dc.contributor.authorMartin, L. W.en_US
dc.contributor.authorHe, Q.en_US
dc.contributor.authorZhan, Q.en_US
dc.contributor.authorChu, Y. -H.en_US
dc.contributor.authorRother, A.en_US
dc.contributor.authorHawkridge, M. E.en_US
dc.contributor.authorMaksymovych, P.en_US
dc.contributor.authorYu, P.en_US
dc.contributor.authorGajek, M.en_US
dc.contributor.authorBalke, N.en_US
dc.contributor.authorKalinin, S. V.en_US
dc.contributor.authorGemming, S.en_US
dc.contributor.authorWang, F.en_US
dc.contributor.authorCatalan, G.en_US
dc.contributor.authorScott, J. F.en_US
dc.contributor.authorSpaldin, N. A.en_US
dc.contributor.authorOrenstein, J.en_US
dc.contributor.authorRamesh, R.en_US
dc.date.accessioned2014-12-08T15:09:49Z-
dc.date.available2014-12-08T15:09:49Z-
dc.date.issued2009-03-01en_US
dc.identifier.issn1476-1122en_US
dc.identifier.urihttp://dx.doi.org/10.1038/nmat2373en_US
dc.identifier.urihttp://hdl.handle.net/11536/7519-
dc.description.abstractDomain walls may play an important role in future electronic devices, given their small size as well as the fact that their location can be controlled. Here, we report the observation of room-temperature electronic conductivity at ferroelectric domain walls in the insulating multiferroic BiFeO(3). The origin and nature of the observed conductivity are probed using a combination of conductive atomic force microscopy, high-resolution transmission electron microscopy and first-principles density functional computations. Our analyses indicate that the conductivity correlates with structurally driven changes in both the electrostatic potential and the local electronic structure, which shows a decrease in the bandgap at the domain wall. Additionally, we demonstrate the potential for device applications of such conducting nanoscale features.en_US
dc.language.isoen_USen_US
dc.titleConduction at domain walls in oxide multiferroicsen_US
dc.typeArticleen_US
dc.identifier.doi10.1038/nmat2373en_US
dc.identifier.journalNATURE MATERIALSen_US
dc.citation.volume8en_US
dc.citation.issue3en_US
dc.citation.spage229en_US
dc.citation.epage234en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000263556800023-
dc.citation.woscount342-
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