應用通道保護層於透明非晶態銦鋅錫氧化物薄膜電晶體技術之研究

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	吳昱達	en_US
dc.contributor.author	Wu, Yu-Ta	en_US
dc.contributor.author	劉柏村	en_US
dc.contributor.author	徐嘉鴻	en_US
dc.contributor.author	Liu, Po-Tsun	en_US
dc.contributor.author	Hsu, Chia-Hung	en_US
dc.date.accessioned	2014-12-12T02:45:00Z	-
dc.date.available	2014-12-12T02:45:00Z	-
dc.date.issued	2014	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#GT070150605	en_US
dc.identifier.uri	http://hdl.handle.net/11536/76217	-
dc.language.iso	zh_TW	en_US
dc.subject	銦錫鋅氧化物薄膜電晶體	zh_TW
dc.subject	通道保護層	zh_TW
dc.subject	In-Sn-Zn-O TFT	en_US
dc.subject	passivation	en_US
dc.title	應用通道保護層於透明非晶態銦鋅錫氧化物薄膜電晶體技術之研究	zh_TW
dc.title	Study on the effect of channel passivation layer on Transparent Amorphous Indium Zinc Tin Oxide thin film transistors	en_US
dc.type	Thesis	en_US
dc.contributor.department	顯示科技研究所	zh_TW
顯示於類別：	畢業論文