標題: | 無塵室黃光區空氣中有機溶劑成分分析及危害探討-以彩色濾光片廠為例 Hazards Analysis of the Organic Solvents in Photolithography of Clean Room: A Case Study of Color Filter Manufacturers. |
作者: | 詹勝欽 Jan Sheng-Chin 陳春盛 Chen Chun-Sung 工學院產業安全與防災學程 |
關鍵字: | 黃光區;有機溶劑;無塵室異味;Photolithography;Organic Solvent;Odor |
公開日期: | 2006 |
摘要: | 彩色濾光片(Color Filter)產業為本研究之研究標的,亦為我國二大重要產業之液晶顯示器產業下游的關鍵零組件,CF產業大量使用有機溶劑後,於無塵室中造成逸散,本研究將針對作業環境空氣中有機溶劑之成分及低濃度危害進行探討。
本研究利用了FID進行黃光區機台各種動作情況下篩檢異味濃度最大值分佈狀況,結果發現異味主要來源為光阻塗佈過程之旋轉塗佈(RTC),最大值為342ppm,而越高代數之產線其數據相對較高。篩檢完成選出採樣點後再以GC/Mass樣品採樣進行定性定量分析,分析結果發現,無塵室空氣中共分析出了37種可測得之化合物,最高濃度之化合物為PGMEA 3244.4 ppb及PGME 4274.6 ppb。最後再將分析結果進行比對與分析探討,與臭味閾值比對後發現,該二類化合物為異味主要產生之化合物。 This study focuses on the industry manufacturing color filters (CF) which are key assembling components of liquid crystal display (LCD). However, CF industry has used a great deal of organic solvents to produce CF, polluting the clean room. This study aims to investigate into ingredients and hazards of the organic solvents in an operation environment. Utilizing FID to sense the odor concentration under operation in the Photolithography, this study found that the main source of the odor came from RTC (one of coating processes of color resist), with value of 342 ppm. After sensing, the sampling was based on GC/Mass to conduct qualitative and quantitative analysis. The result indicated that the air in the clean room contained 37 sensible compounds; and the highest odor concentration associates with PGMEA 3244.4 ppb and PGME 4274.6 ppb. This study then compared the result with odor threshold, and found that these two compounds resulted in high odor concentration. |
URI: | http://140.113.39.130/cdrfb3/record/nctu/#GT009266521 http://hdl.handle.net/11536/77693 |
顯示於類別: | 畢業論文 |