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dc.contributor.authorHsu, Chiung-Chihen_US
dc.contributor.authorHsu, Ray-Quenen_US
dc.contributor.authorWu, Yue-Hanen_US
dc.date.accessioned2014-12-08T15:10:12Z-
dc.date.available2014-12-08T15:10:12Z-
dc.date.issued2010-08-01en_US
dc.identifier.issn0022-0744en_US
dc.identifier.urihttp://dx.doi.org/10.1093/jmicro/dfq053en_US
dc.identifier.urihttp://hdl.handle.net/11536/7790-
dc.description.abstractAn understanding of the structural and optical properties of quantum dots (QDs) is critical for their use in optical communication devices. In this study, single- and multi-layer self-organized InAs QDs grown on (001) GaAs substrates by molecular beam epitaxy (MBE) were investigated. High-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) images show that the lateral size of multi-layer InAs QDs are larger and flatter than single-layer InAs QDs, which are oval-shaped. The change in shape and size may be attributed to the presence of InGaAs spacer layers in multi-layer InAs QDs. Reciprocal spacer mapping and fast Fourier transformation images clearly show that InGaAs spacer layers present in the multi-layer InAs QDs structures help to release the strain originally existing in the QDs. In addition, the photoluminescence peak of the multi-layer InAs QDs is broader than QD in the single-layer one, which implies that the multi-layer InAs QDs size variation is more random than the single-layer one and this corresponds with the HAADF-STEM images. These results prove that spacer layers release strain influencing the morphology and optical properties of the QDs.en_US
dc.language.isoen_USen_US
dc.subjectquantum doten_US
dc.subjectstrainen_US
dc.subjectscanning transmission electron microscopyen_US
dc.subjectphotoluminescenceen_US
dc.subjectreciprocal spacer mappingen_US
dc.subjectfast Fourier transformationen_US
dc.titleMorphology and optical properties of single- and multi-layer InAs quantum dotsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1093/jmicro/dfq053en_US
dc.identifier.journalJOURNAL OF ELECTRON MICROSCOPYen_US
dc.citation.volume59en_US
dc.citation.issueen_US
dc.citation.spageS149en_US
dc.citation.epageS154en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000280705200022-
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