完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 蔡宜庭 | en_US |
dc.contributor.author | Tsai,Yi-Ting | en_US |
dc.contributor.author | 林健正 | en_US |
dc.contributor.author | Chien-Cheng Lin | en_US |
dc.date.accessioned | 2014-12-12T02:55:35Z | - |
dc.date.available | 2014-12-12T02:55:35Z | - |
dc.date.issued | 2005 | en_US |
dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#GT009318502 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/78858 | - |
dc.description.abstract | 本實驗在氬氣為保護氣氛下,以鈦箔(30μm)接合ZrO2,接合時間、溫度為1100℃/36hr~1500℃/36hr。反應後利用掃描式電子顯微鏡(SEM/BEI)、電子微探儀(EPMA)、電子顯微鏡(TEM/EDS)來鑑定ZrO2與鈦箔之介面反應與鈦箔本身的氧化行為。實驗結果顯示,1400℃/36hr與1500℃/36hr反應後,鈦層出現許多孔洞與裂縫,接合效果較差。在鈦箔與氧化鋯之反應中,鈦本身的氧化行為較為顯著,Zr與Ti之交互擴散狀況不明顯。在1100℃/36hr反應後,鈦側經TEM鑑定為α-Ti固溶氧,而氧化鋯側為tetragonal相之ZrO2-x。1200℃/36hr與1300℃/36hr反應後,在鈦側發現針狀之Ti2O3與TiO;氧化鋯側在1300℃/36hr反應後出現許多TiO於晶粒間析出,且觀察到c-ZrO2-x與t-ZrO2-x;1200℃/36hr反應後於氧化鋯側則只發現t-ZrO2-x。1400℃/36hr反應後在鈦側發現TiO,而氧化鋯側則出現t-ZrO2-x。 | zh_TW |
dc.description.abstract | The objective of this work is to joint ZrO2 to itself using Ti foil. The reaction was at the temperature from 1100℃ to 1500℃ in the atmosphere of argon. The microstructure of the reaction interface were characterized by scanning electron microscopy(SEM)、electron probe microanalyzer (EPMA) and analytical transmission electron microscopy(TEM/EDS). After annealing at 1100℃/36h, the dissolution of a large amount of oxygen into titanium gave rise to α-Ti(O) solid solution. At temperature above 1200℃,the oxygen transport through the interface resulting in the growth of titanium oxide, TiO and Ti2O3.In the zirconia side, t-ZrO2 was found after 1100℃/36h-1400℃/36h annealing, and c-ZrO2 was also found after annealing at 1300℃/36h. | en_US |
dc.language.iso | zh_TW | en_US |
dc.subject | 鈦 | zh_TW |
dc.subject | 氧化鋯 | zh_TW |
dc.subject | 接合 | zh_TW |
dc.subject | Titanium | en_US |
dc.subject | Zirconia | en_US |
dc.subject | joint | en_US |
dc.title | 利用鈦金屬將氧化鋯接合之微觀結構分析 | zh_TW |
dc.title | Microstructural Characterization of the ZrO2/Ti interface between 1100℃ and 1500℃ | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
顯示於類別: | 畢業論文 |
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