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dc.contributor.author賴明宏en_US
dc.contributor.author李安謙en_US
dc.contributor.authorAn-Chen Leeen_US
dc.date.accessioned2014-12-12T03:01:42Z-
dc.date.available2014-12-12T03:01:42Z-
dc.date.issued2007en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009375530en_US
dc.identifier.urihttp://hdl.handle.net/11536/80306-
dc.description.abstract本論文應用一種新的R2R(Run-to-Run) 製程控制器-非線性D-EWMA控制器(Non-linear Double Exponentially Weighted Moving Average Controller)來改善化學氣相沈積之硬遮罩硼矽玻璃製程品質。首先由實驗設計得到影響製程品質特性之主要控制因子,再藉由非線性多元迴歸法建立製程控制模型,經由D-EWMA估測器更新每批次之控制模型截距項,再透過最小變異控制器(Minimum Variance Controller)來更新製程配方。本論文利用化學氣相沈積歷史資料來進行模擬及比較非線性D-EWMA與線性D-EWMA控制器之性能,結果顯示非線性D-EWMA可大幅改善硬遮罩硼矽玻璃製中因為製程干擾所產生的製程變異,最後本論文將非線性D-EWMA控制器實際應用於8吋半導體廠中以驗證控制器的效能。zh_TW
dc.description.abstractThis thesis proposes a new Run-to-Run process controller: Non-linear Double Exponentially Weighted Moving Average (D-EWMA) Controller to improve the process variance of Pad-Boron Silicon Glass (Pad-BSG) of Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) process. Firstly, we use Design of Experiment (DOE) method to obtain the control factors which can affect the process characteristic, then the intercept of control model which is established by non-linear multi-regression method can be updated by D-EWMA every batch. The recipe of PE-CVD process is generated by MVC finally. This thesis presents the well performance of a Run-to-Run process controller in simulation with historical process data and experiment it on PE-CVD process in 8-inch fabrication. The simulation and experiment results show that the process variance converges fast and stably to the target value; moreover, the stability of process is also increased.en_US
dc.language.isozh_TWen_US
dc.subject非線性D-EWMAzh_TW
dc.subject最小變異控制器zh_TW
dc.subject硬遮罩硼矽玻璃製程zh_TW
dc.subject化學氣相沈積zh_TW
dc.subjectNon-linear D-EWMA Controlleren_US
dc.subjectMinimum Variance Controller (MVC)en_US
dc.subjectDesign of Experiment (DOE)en_US
dc.subjectPad-Boron Silicon Glass (Pad-BSG)en_US
dc.subjectPlasma Enhanced-Chemical Vapor Deposition (PE-CVD)en_US
dc.title使用非線性D-EWMA控制器改善化學氣相沈積製程zh_TW
dc.titleApplying a Novel Run-to-Run Controller – Nonlinear D-EWMA Controller to Improve Chemical Vapor Deposition Processesen_US
dc.typeThesisen_US
dc.contributor.department工學院半導體材料與製程設備學程zh_TW
顯示於類別:畢業論文