Run-by-run process control of metal sputter deposition: Combining time series and extended kalman filter

標題:	Run-by-run process control of metal sputter deposition: Combining time series and extended kalman filter
作者:	Chen, Juhn-Horng Kuo, Tzu-Wei Lee, An-Chen 機械工程學系 Department of Mechanical Engineering
關鍵字:	d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
公開日期:	1-八月-2007
URI:	http://dx.doi.org/10.1109/TSM.2007.901392 http://hdl.handle.net/11536/10497
ISSN:	0894-6507
DOI:	10.1109/TSM.2007.901392
期刊:	IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Volume:	20
Issue:	3
起始頁:	278
結束頁:	285
顯示於類別：	期刊論文

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