完整後設資料紀錄
DC 欄位語言
dc.contributor.author陳煌文en_US
dc.contributor.authorHuang Wen Chenen_US
dc.contributor.author蔡璧徽en_US
dc.contributor.authorBi-Huei Tsaien_US
dc.date.accessioned2014-12-12T03:10:56Z-
dc.date.available2014-12-12T03:10:56Z-
dc.date.issued2007en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009462501en_US
dc.identifier.urihttp://hdl.handle.net/11536/82330-
dc.description.abstract本文以Cobb-Douglas生產函數為計量模型,針對IC產業上市上櫃公司共82家公司2001年到2006年的縱橫資料﹙panel data﹚進行實證研究。依照「製程創新」與「產品創新」的不同,以及地區的不同,將樣本區分為台灣IC製程公司、台灣無晶圓廠IC設計公司、世界無晶圓廠IC設計公司等共三組樣本。研究目的為: (1) 研發的產出面(公司專利資本存量)的外溢效果對IC全體公司的生產力是否有正面貢獻。(2) 不同創新型態 ( 製程創新與產品創新 ) 在不同的外溢形式 (研發的投入面(公司研發費用資本存量)與產出面(公司專利資本存量) )中其表現是否不同。(3) 不同創新型態 (製程創新與產品創新) 的專利資本存量外溢效果其表現是否不同。(4) 國內外的IC群聚在不同的外溢形式 (研發的投入面(公司研發費用資本存量)與產出面(公司專利資本存量) )中其表現是否不同。(5) 對IC全體公司的生產力而言,專利獨占的時間延長價值是否有正面貢獻。 本文實證結果有以下主要發現:(1) IC全體公司研發的產出面(公司專利資本存量)的外溢效果對生產力有正面貢獻。(2) 以製程創新為主的IC製程公司其研發費用外溢效果較大;以產品創新為主的IC設計公司其專利外溢效果較大。(3) 以製程創新為主的IC製程公司其專利生產力較大。(4) 以直接研發費用之形式探討其外溢效果時,世界IC設計公司外溢效果大於台灣IC設計公司;以專利之形式探討其外溢效果時,台灣IC設計公司外溢效果大於世界IC設計公司。(5) 對IC全體公司的生產力而言,專利獨占的時間延長價值有正面貢獻。zh_TW
dc.description.abstractThis study aims to study the intra-industry Patent spillover effect in Integrated Circuit ﹙IC﹚industry according to Cobb-Douglas production function model on firm-level panel data during year 2001 to 2006. According to the characteristics of process innovation and product innovation, the sample is divided into three categories : (1) process firms in Taiwan, (2) fabless IC design firms in Taiwan, and (3) fabless IC design firms worldwide. The empirical evidence shows the following findings: 1. The spillover effect of patent capital does have significantly contribution to firms’ sales. 2. Regarding the spillover effect by R&D expense, the effect of process innovation is greater than product innovation at significant confidence level; regarding the spillover effect by patent capital, the effect of product innovation is greater than process innovation at significant confidence level. 3. The patent capital productivity of product innovation-based IC design firms is less than process innovation-based IC manufacturing firms at significant confidence level. 4. Regarding the spillover effect by R&D expense, the effect of world-wide IC design firms is greater than Taiwan IC design firms at significant confidence level; Regarding the spillover effect by patent capital, the effect of Taiwan IC design firms is significantly greater than worldwide IC design firms. 5. Regarding all IC sample firms, the prolonging values monopolize by patent have significantly contribution to firms sales.en_US
dc.language.isozh_TWen_US
dc.subject專利zh_TW
dc.subject外溢效果zh_TW
dc.subject製程創新zh_TW
dc.subject產品創新zh_TW
dc.subjectResearch and Developmenten_US
dc.subjectpatenten_US
dc.subjectspillover effecten_US
dc.subjectprocess innovationen_US
dc.subjectproduct innovationen_US
dc.title專利外溢對台灣積體電路公司產出之影響zh_TW
dc.titleThe Effect of Patent Spillover on the Output of the Integrated Circuit Firms in Taiwanen_US
dc.typeThesisen_US
dc.contributor.department管理學院管理科學學程zh_TW
顯示於類別:畢業論文