完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 陳煌文 | en_US |
dc.contributor.author | Huang Wen Chen | en_US |
dc.contributor.author | 蔡璧徽 | en_US |
dc.contributor.author | Bi-Huei Tsai | en_US |
dc.date.accessioned | 2014-12-12T03:10:56Z | - |
dc.date.available | 2014-12-12T03:10:56Z | - |
dc.date.issued | 2007 | en_US |
dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#GT009462501 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/82330 | - |
dc.description.abstract | 本文以Cobb-Douglas生產函數為計量模型,針對IC產業上市上櫃公司共82家公司2001年到2006年的縱橫資料﹙panel data﹚進行實證研究。依照「製程創新」與「產品創新」的不同,以及地區的不同,將樣本區分為台灣IC製程公司、台灣無晶圓廠IC設計公司、世界無晶圓廠IC設計公司等共三組樣本。研究目的為: (1) 研發的產出面(公司專利資本存量)的外溢效果對IC全體公司的生產力是否有正面貢獻。(2) 不同創新型態 ( 製程創新與產品創新 ) 在不同的外溢形式 (研發的投入面(公司研發費用資本存量)與產出面(公司專利資本存量) )中其表現是否不同。(3) 不同創新型態 (製程創新與產品創新) 的專利資本存量外溢效果其表現是否不同。(4) 國內外的IC群聚在不同的外溢形式 (研發的投入面(公司研發費用資本存量)與產出面(公司專利資本存量) )中其表現是否不同。(5) 對IC全體公司的生產力而言,專利獨占的時間延長價值是否有正面貢獻。 本文實證結果有以下主要發現:(1) IC全體公司研發的產出面(公司專利資本存量)的外溢效果對生產力有正面貢獻。(2) 以製程創新為主的IC製程公司其研發費用外溢效果較大;以產品創新為主的IC設計公司其專利外溢效果較大。(3) 以製程創新為主的IC製程公司其專利生產力較大。(4) 以直接研發費用之形式探討其外溢效果時,世界IC設計公司外溢效果大於台灣IC設計公司;以專利之形式探討其外溢效果時,台灣IC設計公司外溢效果大於世界IC設計公司。(5) 對IC全體公司的生產力而言,專利獨占的時間延長價值有正面貢獻。 | zh_TW |
dc.description.abstract | This study aims to study the intra-industry Patent spillover effect in Integrated Circuit ﹙IC﹚industry according to Cobb-Douglas production function model on firm-level panel data during year 2001 to 2006. According to the characteristics of process innovation and product innovation, the sample is divided into three categories : (1) process firms in Taiwan, (2) fabless IC design firms in Taiwan, and (3) fabless IC design firms worldwide. The empirical evidence shows the following findings: 1. The spillover effect of patent capital does have significantly contribution to firms’ sales. 2. Regarding the spillover effect by R&D expense, the effect of process innovation is greater than product innovation at significant confidence level; regarding the spillover effect by patent capital, the effect of product innovation is greater than process innovation at significant confidence level. 3. The patent capital productivity of product innovation-based IC design firms is less than process innovation-based IC manufacturing firms at significant confidence level. 4. Regarding the spillover effect by R&D expense, the effect of world-wide IC design firms is greater than Taiwan IC design firms at significant confidence level; Regarding the spillover effect by patent capital, the effect of Taiwan IC design firms is significantly greater than worldwide IC design firms. 5. Regarding all IC sample firms, the prolonging values monopolize by patent have significantly contribution to firms sales. | en_US |
dc.language.iso | zh_TW | en_US |
dc.subject | 專利 | zh_TW |
dc.subject | 外溢效果 | zh_TW |
dc.subject | 製程創新 | zh_TW |
dc.subject | 產品創新 | zh_TW |
dc.subject | Research and Development | en_US |
dc.subject | patent | en_US |
dc.subject | spillover effect | en_US |
dc.subject | process innovation | en_US |
dc.subject | product innovation | en_US |
dc.title | 專利外溢對台灣積體電路公司產出之影響 | zh_TW |
dc.title | The Effect of Patent Spillover on the Output of the Integrated Circuit Firms in Taiwan | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 管理學院管理科學學程 | zh_TW |
顯示於類別: | 畢業論文 |