AlGaAs/InGaAs high electron mobility transistor grown on Si substrate with Ge/Ge(x)Si(1-x) metamorphic buffer layers

Abstract

Al(0.12)Ga(0.88)As/In(0.18)Ga(0.82)As high-electron-mobility transistor (HEMT) growth oil a Si substrate using the Ge/Ge(x)Si(1-x) buffer is demonstrated. This is the first demonstration of Al(0.12)Ga(0.88)As/In(0.18)Ga(0.82)As HEMT growth on a Ge/Ge(x)Si(1-x) metamorphic buffer layer. The electron mobility ill tile In(0.18)Ga(0.82)As channel of the HEMT sample was 3.550cm(2)/(Vs). After fabrication. the HEMT device demonstrated a saturation current of 150mA/mm with a transconductance 01 155mS/ inns. The wel behaved characteristics of the HEMT device oil the Si substrate are believed to be due to the very thin buffer layer achieved and the lack of tile antiphase boundary (APB) formation and Ge diffusion into the GaAs layers.