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dc.contributor.authorKim, Sung-Oen_US
dc.date.accessioned2014-12-08T15:11:06Z-
dc.date.available2014-12-08T15:11:06Z-
dc.date.issued2008-08-01en_US
dc.identifier.issn0093-3813en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TPS.2008.922939en_US
dc.identifier.urihttp://hdl.handle.net/11536/8509-
dc.description.abstractA Microplasma device utilizing SU-8 photoresist as a barrier rib has been fabricated and characterized operating in the abnormal mode for neon pressures from 300 to 800 torr and having a hexagonal structure, 5 x 5 arrays of microplasma. The microplasma device, which has a simple fabrication process, offers advantages such as low firing voltage, low cost, and stable glow discharge. The electrical properties have been examined by bipolar voltage waveforms with different frequencies. The geometric patterns of the barrier rib can be simply changed by lithographic techniques.en_US
dc.language.isoen_USen_US
dc.subjectmicrodischargeen_US
dc.titleMicroplasma device utilizing SU-8 photoresist as a barrier riben_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TPS.2008.922939en_US
dc.identifier.journalIEEE TRANSACTIONS ON PLASMA SCIENCEen_US
dc.citation.volume36en_US
dc.citation.issue4en_US
dc.citation.spage1244en_US
dc.citation.epage1245en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000258618200192-
dc.citation.woscount2-
Appears in Collections:Articles


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