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dc.contributor.authorLai, Chun-Hungen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2014-12-08T15:11:07Z-
dc.date.available2014-12-08T15:11:07Z-
dc.date.issued2007en_US
dc.identifier.issn0015-0193en_US
dc.identifier.urihttp://hdl.handle.net/11536/8523-
dc.identifier.urihttp://dx.doi.org/10.1080/00150190701527381en_US
dc.description.abstractVarious perovskite structure electroceramic thin films have been studied for semiconductor memory applications. The high permittivity and ferroelectric remanent polarization properties of these materials give the promise of a new generation of advanced dynamic and/or nonvolatile memory devices. The recent study indicates that perovskite oxide showing bistable resistance switching behavior is a highly promising candidate for nonvolatile semiconductor device, the so-called resistance random access memory (RRAM). RRAMs exhibit sufficiently fast switching capability and low operation voltages as compared with flash memory, and bring about the current upsurge in research. This paper summarizes the fabrication and characterization of these potential materials, and provides a broad view of the current status and future trends for perovskite oxides-based RRAMs. The associated conduction mechanisms are also discussed with specific examples from recent literature.en_US
dc.language.isoen_USen_US
dc.subjectPRAMen_US
dc.subjectperovskite thin filmen_US
dc.subjectelectrical propertyen_US
dc.subjectresistance switchingen_US
dc.titlePreparation and properties of perovskite thin films for resistive nonvolatile memory applicationsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1080/00150190701527381en_US
dc.identifier.journalFERROELECTRICSen_US
dc.citation.volume357en_US
dc.citation.spage581en_US
dc.citation.epage+en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000250512400004-
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