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dc.contributor.authorWang, Sheng-Chunen_US
dc.contributor.authorSu, Pinen_US
dc.contributor.authorChen, Kun-Mingen_US
dc.contributor.authorLin, Chien-Tingen_US
dc.contributor.authorLiang, Victoren_US
dc.contributor.authorHuang, Guo-Weien_US
dc.date.accessioned2014-12-08T15:11:07Z-
dc.date.available2014-12-08T15:11:07Z-
dc.date.issued2008-08-01en_US
dc.identifier.issn1531-1309en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LMWC.2008.2001013en_US
dc.identifier.urihttp://hdl.handle.net/11536/8527-
dc.description.abstractFor the first time, the temperature dependences of radio frequency (RF) metal oxide semiconductor field effect transistors' intrinsic noise currents, including the induced gate noise current (i(g)), channel noise current (i(d)) and their correlation noise current, are experimentally investigated. The power spectral densities for the induced gate noise current and correlation noise current are found to rise as temperature increases, and decline for the channel noise current. Moreover, by using van der Ziel's noise model, our experimental results show that, besides ambient temperature, the channel conductance is the main factor dominating the RF noise behaviors. Finally, bias dependence results are also presented.en_US
dc.language.isoen_USen_US
dc.subjectmetal oxide semiconductor field effect transistors (MOSFETs)en_US
dc.subjectnoiseen_US
dc.subjectradio frequency (RF)en_US
dc.subjecttemperatureen_US
dc.subjectvan der Ziel's modelen_US
dc.titleTemperature dependence of high frequency noise behaviors for RF MOSFETsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LMWC.2008.2001013en_US
dc.identifier.journalIEEE MICROWAVE AND WIRELESS COMPONENTS LETTERSen_US
dc.citation.volume18en_US
dc.citation.issue8en_US
dc.citation.spage530en_US
dc.citation.epage532en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000258373400012-
dc.citation.woscount4-
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