Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wang, Sheng-Chun | en_US |
dc.contributor.author | Su, Pin | en_US |
dc.contributor.author | Chen, Kun-Ming | en_US |
dc.contributor.author | Lin, Chien-Ting | en_US |
dc.contributor.author | Liang, Victor | en_US |
dc.contributor.author | Huang, Guo-Wei | en_US |
dc.date.accessioned | 2014-12-08T15:11:07Z | - |
dc.date.available | 2014-12-08T15:11:07Z | - |
dc.date.issued | 2008-08-01 | en_US |
dc.identifier.issn | 1531-1309 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/LMWC.2008.2001013 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/8527 | - |
dc.description.abstract | For the first time, the temperature dependences of radio frequency (RF) metal oxide semiconductor field effect transistors' intrinsic noise currents, including the induced gate noise current (i(g)), channel noise current (i(d)) and their correlation noise current, are experimentally investigated. The power spectral densities for the induced gate noise current and correlation noise current are found to rise as temperature increases, and decline for the channel noise current. Moreover, by using van der Ziel's noise model, our experimental results show that, besides ambient temperature, the channel conductance is the main factor dominating the RF noise behaviors. Finally, bias dependence results are also presented. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | metal oxide semiconductor field effect transistors (MOSFETs) | en_US |
dc.subject | noise | en_US |
dc.subject | radio frequency (RF) | en_US |
dc.subject | temperature | en_US |
dc.subject | van der Ziel's model | en_US |
dc.title | Temperature dependence of high frequency noise behaviors for RF MOSFETs | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/LMWC.2008.2001013 | en_US |
dc.identifier.journal | IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS | en_US |
dc.citation.volume | 18 | en_US |
dc.citation.issue | 8 | en_US |
dc.citation.spage | 530 | en_US |
dc.citation.epage | 532 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000258373400012 | - |
dc.citation.woscount | 4 | - |
Appears in Collections: | Articles |
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