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dc.contributor.authorChen, J. F.en_US
dc.contributor.authorChiang, C. H.en_US
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorChi, J. Y.en_US
dc.date.accessioned2014-12-08T15:11:11Z-
dc.date.available2014-12-08T15:11:11Z-
dc.date.issued2008-07-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2959598en_US
dc.identifier.urihttp://hdl.handle.net/11536/8577-
dc.description.abstractThis work investigates the surfactant effect on exposed and buried InAs quantum dots (QDs) by incorporating Sb into the QD layers with various Sb beam equivalent pressures (BEPs). Secondary ion mass spectroscopy shows the presence of Sb in the exposed and buried QD layers with the Sb intensity in the exposed layer substantially exceeding that in the buried layer. Incorporating Sb can reduce the density of the exposed QDs by more than two orders of magnitude. However, a high Sb BEP yields a surface morphology with a regular periodic structure of ellipsoid terraces. A good room-temperature photoluminescence (PL) at similar to 1600 nm from the exposed QDs is observed, suggesting that the Sb incorporation probably improves the emission efficiency by reducing the surface recombination velocity at the surface of the exposed QDs. Increasing Sb BEP causes a blueshift of the emission from the exposed QDs due to a reduction in the dot height as suggested by atomic force microscopy. Increasing Sb BEP can also blueshift the similar to 1300 nm emission from the buried QDs by decreasing the dot height. However, a high Sb BEP yields a quantum well-like PL feature formed by the clustering of the buried QDs into an undulated planar layer. These results indicate a marked Sb surfactant effect that can be used to control the density, shape, and luminescence of the exposed and buried QDs. (C) 2008 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleEffect of antimony incorporation on the density, shape, and luminescence of InAs quantum dotsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2959598en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume104en_US
dc.citation.issue2en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000258174800023-
dc.citation.woscount7-
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