標題: | Dynamic negative bias temperature instability in low-temperature poly-Si thin-film transistors |
作者: | Chen, Chih-Yang Wang, Tong-Yi Ma, Ming-Wen Chen, Wei-Cheng Lin, Hsiao-Yi Yeh, Kuan-Lin Wang, Shen-De Lei, Tan-Fu 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | dynamic negative bias temperature instability;thin-film transistor |
公開日期: | 2007 |
摘要: | Dynamic negative bias temperature instability in p-channel low-temperature poly-Si thin-film transistors was studied in this paper. The degradation of the devices was found to be voltage and temperature dependent. In addition, the frequency and duty ratio of the gate pulse affects the degree of the device degradation. The mechanism of the device degradation was investigated, and a physical model is proposed to explain the mechanism. |
URI: | http://hdl.handle.net/11536/8778 |
ISBN: | 978-7-5617-5228-9 |
期刊: | AD'07: Proceedings of Asia Display 2007, Vols 1 and 2 |
起始頁: | 1233 |
結束頁: | 1237 |
Appears in Collections: | Conferences Paper |