标题: Design to suppress return-back leakage current of charge pump circuit in low-voltage CMOS process
作者: Weng, Yi-Hsin
Tsai, Hui-Wen
Ker, Ming-Dou
电机学院
College of Electrical and Computer Engineering
公开日期: 1-五月-2011
摘要: A new charge pump circuit has been proposed to suppress the return-back leakage current without suffering the gate-oxide reliability problem in low-voltage CMOS process. The four-phase clocks were used to control the charge-transfer devices turning on and turning off alternately to suppress the return-back leakage current. A test chip has been implemented in a 65-nm CMOS process to verify the proposed charge pump circuit with four pumping stages. The measured output voltage is around 8.8 V with 1.8-V supply voltage to drive a capacitive output load, which is better than the conventional charge pump circuit with the same pumping stages. By reducing the return-back leakage current and without suffering gate-oxide overstress problem, the new proposed charge pump circuit is suitable for applications in low-voltage CMOS IC products. (C) 2011 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.microrel.2010.12.016
http://hdl.handle.net/11536/8938
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2010.12.016
期刊: MICROELECTRONICS RELIABILITY
Volume: 51
Issue: 5
起始页: 871
结束页: 878
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