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dc.contributor.author黃遠東en_US
dc.contributor.authorHUANG YANG-TUNGen_US
dc.date.accessioned2014-12-13T10:31:04Z-
dc.date.available2014-12-13T10:31:04Z-
dc.date.issued2013en_US
dc.identifier.govdocNSC102-2120-M009-005zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/90684-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=3104377&docId=420207en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.title學研合作計畫-極紫外光微影技術II (EUVL II)-從光源、檢測分析技術到奈米元件可靠度研究(III)zh_TW
dc.titleInvestigations on Extreme Ultraviolet Lithography II (EUVL II)- from Light Source, Metrology, to Reliability of Nano Devicesen_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系及電子研究所zh_TW
Appears in Collections:Research Plans