完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | 黃遠東 | en_US |
| dc.contributor.author | HUANG YANG-TUNG | en_US |
| dc.date.accessioned | 2014-12-13T10:31:04Z | - |
| dc.date.available | 2014-12-13T10:31:04Z | - |
| dc.date.issued | 2013 | en_US |
| dc.identifier.govdoc | NSC102-2120-M009-005 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/90684 | - |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=3104377&docId=420207 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.title | 學研合作計畫-極紫外光微影技術II (EUVL II)-從光源、檢測分析技術到奈米元件可靠度研究(III) | zh_TW |
| dc.title | Investigations on Extreme Ultraviolet Lithography II (EUVL II)- from Light Source, Metrology, to Reliability of Nano Devices | en_US |
| dc.type | Plan | en_US |
| dc.contributor.department | 國立交通大學電子工程學系及電子研究所 | zh_TW |
| 顯示於類別： | 研究計畫 | |
