標題: Variations of V(t) Retention Loss in a SONOS Flash Memory Due to a Current-Path Percolation Effect
作者: Chou, Y. L.
Chung, Y. T.
Wang, Tahui
Ku, S. H.
Zou, N. K.
Chen, Vincent
Lu, W. P.
Chen, K. C.
Lu, Chih-Yuan
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-四月-2011
摘要: Discrete nitride program charge loss in a small-area SONOS Flash memory cell during retention is observed. Our measurement shows that a retention V(t) of a programmed SONOS cell exhibits a stepwise evolution with retention time. Individual single-program charge-loss-induced threshold voltage shifts (Delta V(t)) are characterized. We find the following: 1) The magnitude of Delta V(t) exhibits an exponential distribution, which is believed due to a current-path percolation effect caused by random program charges and substrate dopants, and 2) program-state V(t) retention loss has large variations in different cells and P/E cycles due to the percolation effect. We develop a Monte Carlo analysis to take into account the distribution of Delta V(t) and a tunneling front model to study the spread of a retention V(t) distribution in a SONOS Flash memory.
URI: http://dx.doi.org/10.1109/LED.2011.2109031
http://hdl.handle.net/11536/9073
ISSN: 0741-3106
DOI: 10.1109/LED.2011.2109031
期刊: IEEE ELECTRON DEVICE LETTERS
Volume: 32
Issue: 4
起始頁: 458
結束頁: 460
顯示於類別:期刊論文