標題: | Variations of V(t) Retention Loss in a SONOS Flash Memory Due to a Current-Path Percolation Effect |
作者: | Chou, Y. L. Chung, Y. T. Wang, Tahui Ku, S. H. Zou, N. K. Chen, Vincent Lu, W. P. Chen, K. C. Lu, Chih-Yuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-四月-2011 |
摘要: | Discrete nitride program charge loss in a small-area SONOS Flash memory cell during retention is observed. Our measurement shows that a retention V(t) of a programmed SONOS cell exhibits a stepwise evolution with retention time. Individual single-program charge-loss-induced threshold voltage shifts (Delta V(t)) are characterized. We find the following: 1) The magnitude of Delta V(t) exhibits an exponential distribution, which is believed due to a current-path percolation effect caused by random program charges and substrate dopants, and 2) program-state V(t) retention loss has large variations in different cells and P/E cycles due to the percolation effect. We develop a Monte Carlo analysis to take into account the distribution of Delta V(t) and a tunneling front model to study the spread of a retention V(t) distribution in a SONOS Flash memory. |
URI: | http://dx.doi.org/10.1109/LED.2011.2109031 http://hdl.handle.net/11536/9073 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2011.2109031 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 32 |
Issue: | 4 |
起始頁: | 458 |
結束頁: | 460 |
顯示於類別: | 期刊論文 |