以自組裝奈米孔洞SiO2作為次70 nm IC技術之超低介電薄膜之應用研究(II)

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DC Field	Value	Language
dc.contributor.author	潘扶民	en_US
dc.contributor.author	PAN FU-MING	en_US
dc.date.accessioned	2014-12-13T10:31:25Z	-
dc.date.available	2014-12-13T10:31:25Z	-
dc.date.issued	2004	en_US
dc.identifier.govdoc	NSC93-2215-E009-028	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/90913	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=1026685&docId=195178	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	以自組裝奈米孔洞SiO2作為次70 nm IC技術之超低介電薄膜之應用研究(II)	zh_TW
dc.title	Self-Assembly Nanoporous Silica as an Ultra-Low K Dielectric for Sub-70 nm IC Technologies(II)	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學材料科學與工程系	zh_TW
Appears in Collections:	Research Plans

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