| 標題: | 利用高效能熱製程改善低溫複晶矽薄膜電晶體之電性表現 The Performance of Poly-Si TFT was Improved by High Performance Thermal Process |
| 作者: | 馮明憲 交通大學材料科學與工程研究所 |
| 公開日期: | 2004 |
| 官方說明文件#: | NSC93-2215-E009-038 |
| URI: | http://hdl.handle.net/11536/91428 https://www.grb.gov.tw/search/planDetail?id=1026710&docId=195186 |
| 顯示於類別： | 研究計畫 |
- 利用無電鍍鈀誘發非晶矽薄膜結晶製作複晶矽薄膜電晶體之研究 / 黃添鈞;Tien-Chun Huang;吳耀銓;馮明憲;YewChung Sermon Wu
- Characterization of the novel polysilicon TFT with a subgate coupling structure / Chang, KM;Chung, YH;Deng, CG;Chung, YF;Lin, JH
- 複晶矽薄膜電晶體關鍵技術之研究 / 劉仲;Liu, Chung;葉清發;Ching-Fa Yeh
- Enhanced performance of poly-Si thin film transistors using fluorine ions implantation / Tu, CH;Chang, TC;Liu, PT;Zan, HW;Tai, YH
- 低溫複晶矽薄膜電晶體之研究 / 石坤桓;K. H. Shih;荊鳳德;吳啟宗;Albert Chin
- CF4 plasma treatment for fabricating high-performance and reliable solid-phase-crystallized poly-Si TFTs / Wang, SD;Lo, WH;Lei, TF
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