高效率能源技術研究發展計畫-潔淨室省能技術與半導體製程省能技術

Abstract

※關鍵詞：潔淨室流場設計；室溫選擇性液相沉積絕緣膜技術；低溫製程；快速加熱 本年度工作延續上一年度的成果，繼續進一步的研發，並對這五年的計畫作一總結。 計畫目標與工作內容為： (1)潔淨室整體設計；建立設計資料庫；技術擴散 (2)室溫液相沉積絕緣膜技術試產高品質絕緣膜；選擇性液相沉積法成長奈米尺寸閘極；技術擴散 (3)發展低溫濺鍍薄膜製程成長高品質鈦酸鍶鋇薄膜。 (4)12吋晶圓快速加熱薄膜成長均溫與省能技術開發。 其中第五年計畫著重產品之實驗室試產，技術之驗證，並與業界聯繫，使技術擴散。 經由上述工作內容，期能建立半導體產業及相關部門之共通性節約能源技術，以提升能源使用效率；培育能源相關人才以擴大能源科技團隊。

？HHH？HHXkeyword: Cleanroom design, Room-temperature selective liquid-phase deposition technology. Following the study last year, further research and development is proceeded. The aim of the project in this year is: 1.The design of FFU type cleanroom, establishment of design database, technology expansion 2.Development of room-temperature liquid-phase deposition technology and selective liquid-phase deposition technology (S-LPD), technology expansion 3.Development of Low temperature rf-sputtering process 4.Development of temperature uniformity and energy saving technology for 12-inch wafer are in rapid thermal processing (RTP). In summary, through this ？HHH？HH？H？HHigh-Efficiency Energy Technology Research and Development？HHH？HHH project, some specific and substantial energy saving technologies can be developed for the semi-conductor and related industrial. In addition, the training of energy-related personnel for energy saving can aid Taiwan with enormous capacity of competition in the world of twenty-first century.