高透射率嵌附層、唯相移層、極短紫外光反射式圖罩吸收層與緩衝層之材料、電漿蝕刻與性質探討(I)

標題:	高透射率嵌附層、唯相移層、極短紫外光反射式圖罩吸收層與緩衝層之材料、電漿蝕刻與性質探討(I) Studies on Materials, Plasma Etchings and Properties of High T% Embedded Layers, Shifter only Layers, Extreme UV Mask's Absorbers and Buffers (I)
作者:	龍文安 Loong Wen-an 國立交通大學應用化學系
公開日期:	2003
官方說明文件#:	NSC92-2215-E009-066
URI:	http://hdl.handle.net/11536/92165 https://www.grb.gov.tw/search/planDetail?id=873559&docId=167362
Appears in Collections:	Research Plans

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