電漿處理應用在超大型積體電路上高介電常數閘極絕緣層之研究

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DC Field	Value	Language
dc.contributor.author	雷添福	en_US
dc.contributor.author	LEI TAN-FU	en_US
dc.date.accessioned	2014-12-13T10:33:37Z	-
dc.date.available	2014-12-13T10:33:37Z	-
dc.date.issued	2003	en_US
dc.identifier.govdoc	NSC92-2215-E009-060	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/92172	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=873539&docId=167356	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	電漿處理應用在超大型積體電路上高介電常數閘極絕緣層之研究	zh_TW
dc.title	The Study of Plasma Treatment on High-k Gate Dielectrics for ULSI Applications	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學電子工程研究所	zh_TW
Appears in Collections:	Research Plans

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